Technical Parameters
|
Model |
APS（nm） |
Purity（%） |
Specific surface area（m2/g） |
Volume density（g/cm3） |
Density（g/cm3） |
Crystal form |
Color |
|
ST-TM-001 |
800 |
>99.99 |
8 |
1.3 |
2.9 |
alpha |
grey |
Note: according to user requirements of nano particle can provide different size products.
Application direction
Mainly applies in the polycrystalline silicon and in the unit crystal smelting process, the silica pot drawing of patterns uses. When polycrystalline silicon and monocrystalline silicon production, in raw material melts, in the crystal growth process, the silicon melt and the crucible long time contact can produce mounts the viscosity. Because two material’s thermal-expansion coefficients are different, if the silicon material and the crucible wall union is close, when crystal cooling very possibly creates the crystalline silicon or the crucible breakage. But the silicon melt and crucible’s long time contact will also create clay crucible’s corrosion, will cause in the polycrystalline silicon the oxygen concentration to elevate. In order to solve these problems, in the overseas craft uses the high pure silicon nitride material to be attached to crucible’s endophragm generally as the coating, the isolation silicon melt and crucible’s immediate contact, not only solved has mounted stagnates the question, moreover might reduce impurity densities and so on the polycrystalline silicon oxygen, coal. Casting polycrystalline silicon which grows using the directional freeze technology, in the most situations the crucible is the consumables, cannot the repetitive cycle use, namely each stove polycrystalline silicon need to consume a clay crucible. After using the silicon nitride coating, may enable the quartz clay crucible to obtain the redundant use, reduced the production cost Our company according to the polycrystalline silicon and the monocrystalline silicon technique of production characteristic large scale, the development has sold the silica pot special-purpose remover and the related spray coating craft. The high pure silicon nitride release agent granularity between 0.5-1.2 micron, may solve effectively in the coating high temperature solidification process oxidized question, causes the polycrystalline silicon and the monocrystalline silicon purity obtains the large scale enhancement, its powder’s purity may reach above 99.99%, may serve as the light to bend down in the industry to smelt the polycrystalline silicon ingot casting the silica pot coating material. But prevents the crucible endophragm and the fusing silicon material cementation effectively, the convenient drawing of patterns, simultaneously plays the impediment level role, the guarantee silicon spindle purity. Compare with a nanometer silicon nitride or other type release agent, have the outstanding oxidation resistance performance, guarantees in the production process impurity densities and so on carbon, oxygen to obtain the active control. The product purity is high, the granularity is even, in the performance definitely may compare with the overseas similar products, at present has realized the batched production. Therefore may solve present domestic silica pot coating powder total dependence imports,substitute forJapan UBE, German Starck, and has the great cost advantage.
Storage conditions
This product should be stored in dry, cool and sealing of the environment, can not be exposure to air, in addition should avoid the heavy pressure, according to ordinary goods transportation.
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